Skip to main content

Excimer Lasers for Microlithography

  • Chapter
Excimer Laser Technology

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 229.00
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 299.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book
USD 299.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. P. Rai-Choudhury (Ed.): Handbook of Microlithography, Micromachining and Microfabrication (co-published by SPIE and The Institution of Electrical Engineers, 1997)

    Google Scholar 

  2. G.E. Moore: Electronics 38(8) (1965)

    Google Scholar 

  3. http://public.itrs.net/

    Google Scholar 

  4. D. Tennenhouse: “Nano-scale technologie: Getting from science to engineering”, in Proceedings of Nanotech, Intel, Boston, MA, USA (08 March 2004)

    Google Scholar 

  5. 5. B.J. Lin: Journal of Microlithography, Microfabrication and Microsystems 3, 377 (2004)

    Google Scholar 

  6. W. Zschocke, H.S. Albrecht, T. Schroeder, I. Bragin, P. Lokai, F. Seddighi, C. Reusch, A. Cortona, K. Schmidt, R. Paetzel, K. Vogler: Proceedings of SPIE 4691, 1722–1733 (2002)

    Google Scholar 

  7. C. Oh, V.B. Fleurov, T. Hofmann, T.P. Duffey, F. Trintchouk, P. O’Keeffe, P.C. Newman, G.M. Blumenstock: Proceedings of SPIE 4691, 1753–1760 (2002)

    Google Scholar 

  8. K. Vogler, I. Klaft, F. Voss, I. Bragin, E. Bergmann, T. Nagy, N. Niemoeller, S. Spratte, R. Paetzel: Proceedings of SPIE 4691, 660–670 (2002)

    Google Scholar 

  9. S.V. Govorkov, A.O. Wiessner, G. Hua, T.V. Misuryaev, A.N. Knysh, S. Spratte, P. Lokai, T. Nagy, I. Bragin, A. Targsdorf, T. Schroeder, H. Albrecht, R. Desor, T. Schmidt, R. Paetzel: Proceedings of SPIE 5377, 1787–1796 (2004)

    Google Scholar 

  10. K. Kakizaki, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, Y. Kawasuji, Y. Watanabe, M. Kaminishi, T. Inoue, H. Mizoguchi, T. Kumazaki, T. Ariga, T. Watanabe, T. Yabu, K. Sasano, T. Hori, O. Wakabayashi, A. Sumitani: Proceedings of SPIE 5377, 1805–1814 (2004)

    Google Scholar 

  11. T. Ishihara, H. Besaucele, C.A. Maley, V.B. Fleurov, P. O’Keeffe, M.E. Haviland, R.G. Morton, W.D. Gillespie, T.S. Dyer, B. Moosman, R. Poole: Proceedings of SPIE 5377, 1858–1865 (2004)

    Google Scholar 

Download references

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2005 Springer-Verlag Berlin Heidelberg

About this chapter

Cite this chapter

Pätzel, R., Stamm, U. (2005). Excimer Lasers for Microlithography. In: Basting, D., Marowsky, G. (eds) Excimer Laser Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-26667-4_9

Download citation

Publish with us

Policies and ethics